| 摘要 |
Disclosed herein are systems and methods for filtering photoresist liquids that may be dispensed into a process chamber used to manufacture semiconductor devices. The system may include one or more active filter devices that distribute electrical or mechanical energy into a fluid conduit. The energy may be used to remove particles or molecules based on their size, weight, ionic charge, molecular weight, or a combination thereof. The energy sources may include, but are not limited to, electromagnetic, acoustic, pneumatic, and/or mechanical vibration sources. |
