发明名称 PLASMA ETCHING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a plasma etching device that can be efficiently cooled even in an adhesion method for a protective tape or a rigid substrate.SOLUTION: The plasma etching device comprises grooves 40 and a plurality of protruding portions 41 on a holding surface 21 of a chuck table 22 that holds a work piece. The grooves 40 are formed by being communicated in a honeycomb form in which regular hexagons are planarly filled across a whole surface of the holding surface 21. The protruding portions 41 are formed protruding onto a regular hexagonal holding surface 21a in the honeycomb form. In the grooves 40 are formed a plurality of injection holes to be supplied with cooling medium gas. A protruding height of the protruding portions 41 from the holding surface 21a is formed to be equal to a height at which a backside of a protective tape contacts the holding surface 21a when the protective tape bonded to a front face of a work piece is placed in contact with the protruding portions 41.</p>
申请公布号 JP2015138807(A) 申请公布日期 2015.07.30
申请号 JP20140008093 申请日期 2014.01.20
申请人 DISCO ABRASIVE SYST LTD 发明人 YAMADA TOMOHIRO;ARAMI JUNICHI
分类号 H01L21/683;H01L21/3065 主分类号 H01L21/683
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