发明名称 MULTIPLE PHASE CHANGE MATERIALS IN AN INTEGRATED CIRCUIT FOR SYSTEM ON A CHIP APPLICATION
摘要 A device includes first and second pluralities of memory cells with memory elements and first and second capping materials on the first and second pluralities of memory cells. First and second capping materials can comprise lower and higher density silicon nitrides. The memory elements can include a programmable resistance memory material, and the capping materials can contact the memory elements. The first and second pluralities of memory cells can have a common cell structure. The first memory cells in the can comprise a top and bottom electrodes with a memory material therebetween and the first capping material contacting the memory material. Control circuits can apply different write algorithms to the first and second pluralities of memory cells. The first and second sets of memory cells can have different operational memory characteristics by forming the first and second capping layers using different capping materials but with the same cell structure.
申请公布号 US2015214479(A1) 申请公布日期 2015.07.30
申请号 US201514603647 申请日期 2015.01.23
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 LUNG Hsiang-Lan;WU Chao-I;CHIEN Wei-Chih
分类号 H01L45/00;G11C13/00 主分类号 H01L45/00
代理机构 代理人
主权项 1. A device, comprising: a first plurality of memory cells and a first capping material on the first plurality of memory cells; a second plurality of memory cells and a second capping material on the second plurality of memory cells; and the first capping material being different from the second capping material.
地址 Hsinchu TW