ACQUISITION METHOD FOR S-PARAMETERS IN MICROWAVE INTRODUCTION MODULES, AND MALFUNCTION DETECTION METHOD

摘要

A plasma processing apparatus (1) includes a processing container (2) and a microwave introduction device (5) having a plurality of microwave introduction modules (61). A microwave is introduced for each of the plurality of microwave introduction modules (61), and S-parameters for each of combinations of the plurality of microwave introduction modules (61) are obtained based on the introduced microwave and a reflected microwave reflected from the processing container (2) into the plurality of microwave introduction modules (61).

主权项

1. A method for acquiring S-parameters of microwave introduction modules in a plasma processing apparatus including a processing container in which a workpiece is accommodated, a microwave introduction device including a plurality of microwave introduction modules configured to introduce a microwave into the processing container for generating plasma in the processing container, and an exhauster configured to evacuate an interior of the processing container in a pressure reducing manner, the method comprising:
while the plurality of microwave introduction modules is configured to introduce the microwave into different locations in the processing container, putting the interior of the processing container in a vacuum state and a state that no plasma is generated; inducing the microwave from each of the plurality of microwave introduction modules; and obtaining S-parameters for each of combinations of two selected from the plurality of microwave introduction modules based on the microwave and a reflected microwave that is reflected from the processing container into the plurality of microwave introduction modules.