发明名称 |
WET STATION |
摘要 |
There is provided a wet station including: a loading unit to and from which a front open unified pod (FOUP) in which semiconductor wafers are installed and a stocker in which dummy wafers are installed are loaded and unloaded; a wafer transferring robot removing the semiconductor wafers from the loaded FOUP and loading the semiconductor wafers into a wafer guide; a dummy transferring robot removing the dummy wafers from the loaded stocker and loading the dummy wafers into empty slots of the wafer guide in which the semiconductor wafers have not been loaded; and a processing chamber receiving the wafer guide fully loaded with the semiconductor wafers and the dummy wafers and performing a cleaning process on the semiconductor wafers. |
申请公布号 |
US2015214079(A1) |
申请公布日期 |
2015.07.30 |
申请号 |
US201414323154 |
申请日期 |
2014.07.03 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
EOM Dae Hong;KIM Kyung Hyun;SON Hyun Ho |
分类号 |
H01L21/67;H01L21/677;H01L21/673 |
主分类号 |
H01L21/67 |
代理机构 |
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代理人 |
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主权项 |
1. A wet station, comprising:
a loading unit to and from which a front open unified pod (FOUP) in which semiconductor wafers are installed and a stocker in which dummy wafers are installed are loaded and unloaded; a wafer transferring robot removing the semiconductor wafers from the loaded FOUP and loading the semiconductor wafers into a wafer guide; a dummy transferring robot removing the dummy wafers from the loaded stocker and loading the dummy wafers into empty slots of the wafer guide in which the semiconductor wafers have not been loaded; and a processing chamber receiving the wafer guide fully loaded with the semiconductor wafers and the dummy wafers and performing a cleaning process on the semiconductor wafers. |
地址 |
Suwon-si KR |