| 摘要 |
The present invention relates to a fume-removing device comprising: a wafer cassette in which wafers are loaded; and an exhaust unit for discharging fumes of the wafers loaded in the wafer cassette, wherein the wafer cassette comprises: a loading rack which is provided at both side surfaces and loads the wafers; and a front opening part provided at the front of the device such that a wafer to be loaded in the loading rack enters therethrough, the loading rack comprises an inclined part provided to be inclined towards the wafers loaded in the loading rack as the inclined part is closer to the front opening part, and the inclined part has a purge gas outlet through which a purge gas is supplied to the wafers loaded in the loading rack. According to the present invention, process gas remaining on wafers can be efficiently removed. |
