PHOTORESIST DRYING APPARATUS

摘要

A photoresist drying apparatus (100) is used for extracting a solvent in photoresist (300). The photoresist drying apparatus comprises a cavity (10), a sieve plate (40) opened with multiple sieve meshes (44) and an air extraction unit (50). The cavity comprises a top wall (12) opened with an air extraction hole (120), a bottom wall (14) opposite to the top wall and a side wall (16) that connects the top wall to the bottom wall. A glass substrate (200) coated with the photoresist is located inside the cavity. The sieve plate is accommodated inside the cavity and located between the photoresist and the top wall. The air extraction unit is located outside the cavity and is connected to the air extraction hole to extract air from the cavity through the air extraction hole.