EXPOSING METHOD AND EXPOSING LIGHT PATH OF HOLOGRAPHIC GRATING

摘要

An exposing method and an exposing light path of a holographic grating. The exposing method comprises the steps of regulating positions of two exposing light sources (S1, S2) to form an exposing light path: (1) determining initial positions of the two exposing light sources (S1, S2); (2) computing a imaging quality parameter of the grating formed after a simulated initial light path works; (3) arranging a compensating lens (A1) in the initial light path, (4) regulating the positions of the exposing light source (S1) to a new position (D1) according to the position of the compensating lens (A1); (5) computing an imaging quality parameter of the grating formed after a new simulated light path works; and (6) determining whether a difference of the imaging quality parameter in the step (5) and the imaging quality parameter in the step (2) is proper. In the current condition, the new position (D1) is used as a finial position of the exposing light source (S1), and the new light path corresponding to the new position (D1) is used as the final exposing light path. By using the exposing method and exposing light path, the problem that the distance between exposing light sources is excessively short can be effectively solved on the premise that manufacturing requirements and imaging requirements of the grating are not affected.