发明名称 PROCESSING LIQUID NOZZLE
摘要 Disclosed is a processing liquid nozzle that supplies a processing liquid to a substrate. The processing liquid nozzle includes: a hollow nozzle body; a processing liquid flow space formed inside the nozzle body; and a processing liquid flow path configured to connect a processing liquid ejection port formed in a lower portion of the nozzle body and the processing liquid flow space with each other. The processing liquid flow path perforates the nozzle body in a vertical direction. The processing liquid flow path includes a foreign matter collecting space which is formed below an upper end of the processing liquid flow path so as to sediment and collect foreign matters in the processing liquid.
申请公布号 US2015209814(A1) 申请公布日期 2015.07.30
申请号 US201514598298 申请日期 2015.01.16
申请人 Tokyo Electron Limited 发明人 NISHIMURA Satoshi;IMOTO Naoki
分类号 B05B15/00;B05B1/00 主分类号 B05B15/00
代理机构 代理人
主权项 1. A processing liquid nozzle that supplies a processing liquid to a substrate, the processing liquid nozzle comprising: a hollow nozzle body; a processing liquid flow space formed inside the nozzle body; and a processing liquid flow path configured to connect a processing liquid ejection port formed in a lower portion of the nozzle body and the processing liquid flow space with each other, the processing liquid flow path perforating the nozzle body in a vertical direction, wherein the processing liquid flow path includes a foreign matter collecting space which is formed below an upper end of the processing liquid flow path so as to sediment and collect foreign matters in the processing liquid.
地址 Tokyo JP