发明名称 |
DEFECT-LESS DIRECT SELF-ASSEMBLY |
摘要 |
Techniques herein enable executing directed self-assembly of block copolymer patterning processes that result in patterns having no defects or a negligibly low occurrence of defects to have a high yield of functional patterns and devices. Methods include executing a same DSA patterning sequence two or more times such that any defects in from a phase-separated first block copolymer film are corrected with a phase-separated second block copolymer film as any defect in the second block copolymer film would only temporarily cover a feature already created and/or transferred from first block copolymer film. |
申请公布号 |
WO2015112874(A1) |
申请公布日期 |
2015.07.30 |
申请号 |
WO2015US12705 |
申请日期 |
2015.01.23 |
申请人 |
TOKYO ELECTRON LIMITED;TOKYO ELECTRON U.S. HOLDINGS, INC. |
发明人 |
DEVILLIERS, ANTON J. |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|