发明名称 METHOD FOR PRODUCING THIN FILM CONTAINING MOLYBDENUM, THIN FILM-FORMING STARTING MATERIAL, AND MOLYBDENUM IMIDE COMPOUND
摘要 In the method of the present invention for producing a thin film, including introducing, onto a substrate, a vapor that has been obtained by vaporizing a thin-film-forming material including a molybdenum imide compound represented by the following formula (I) and that includes the molybdenum imide compound; and then forming a thin film including molybdenum on the substrate by decomposing and/or chemically reacting the molybdenum imide compound. (In the formula, R1 though R10 each represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and R11 represents a linear or branched alkyl group having 1 to 8 carbon atoms.)
申请公布号 SG11201501107X(A) 申请公布日期 2015.07.30
申请号 SGX11201501107 申请日期 2013.10.15
申请人 ADEKA CORPORATION 发明人 SATO, HIROKI;UEYAMA, JUNJI
分类号 C23C16/40;C07F11/00;C07F17/00 主分类号 C23C16/40
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