发明名称 THIN FILM TRANSISTOR MOUNTING SUBSTRATE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin film transistor mounting substrate which can compose a light-shielding layer for blocking incident light on a semiconductor layer of a thin film transistor in a simple manufacturing method.SOLUTION: A thin film transistor mounting substrate manufacturing method comprises the steps of: sequentially depositing on a surface of a transparent insulating substrate 11 when forming a light-shielding layer 13 on the transparent insulating substrate 11 in accordance with a semiconductor layer 15, the light-shielding layer 13, an insulation layer 14 and the semiconductor layer 15 to form a three-layer composition; and integrally patterning and etching each element of the layered three-layer composition.
申请公布号 JP2015138867(A) 申请公布日期 2015.07.30
申请号 JP20140009266 申请日期 2014.01.22
申请人 JAPAN DISPLAY INC 发明人 YOTSUMOTO SHIGEYUKI
分类号 H01L21/336;G02F1/1335;G02F1/1368;H01L29/786 主分类号 H01L21/336
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