SYSTEMS AND METHODS FOR GENERATING BACKSIDE SUBSTRATE TEXTURE MAPS FOR DETERMINING ADJUSTMENTS FOR FRONT SIDE PATTERNING
摘要
<p>Techniques disclosed herein a method and system for generating texture maps for the backside of a substrate. The texture maps may be used to determine process adjustments (e.g., depth of focus) for subsequent processing of the front side of the substrate.</p>
申请公布号
WO2015112884(A1)
申请公布日期
2015.07.30
申请号
WO2015US12726
申请日期
2015.01.23
申请人
TOKYO ELECTRON LIMITED;TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人
DEVILLIERS, ANTON J.;MATHEWS, TODD A.;ROBISON, RODNEY LEE
