发明名称 SUBSTRATE STRUCTURE AND FABRICATION METHOD THEREOF
摘要 A substrate structure is provided, which includes: a substrate body having a plurality of conductive pads; an insulating layer formed on the substrate body and having a plurality of openings for correspondingly exposing the conductive pads; and a plurality of ring bodies formed in the openings and corresponding in position to edges of the conductive pads. As such, a plurality of conductive elements can be subsequently formed inside the ring bodies so as to be prevented by the ring bodies from expanding outward during a reflow process, thereby protecting the insulating layer from being compressed by the conductive elements and preventing cracking of the insulating layer.
申请公布号 US2015214168(A1) 申请公布日期 2015.07.30
申请号 US201414463049 申请日期 2014.08.19
申请人 Siliconware Precision Industries Co., Ltd. 发明人 Chang Cheng-An;Sun Sung-Huan;Liao Wen-Kai;Wu Chien-Hung;Chen Yi-Cheih
分类号 H01L23/00;H05K1/03;H05K1/11 主分类号 H01L23/00
代理机构 代理人
主权项 1. A substrate structure, comprising: a substrate body having a plurality of conductive pads; an insulating layer formed on the substrate body and having a plurality of openings for correspondingly exposing the conductive pads; and a plurality of ring bodies formed in the openings and corresponding in position to edges of the conductive pads.
地址 Taichung TW