OPENING AND CLOSING APPARATUS FOR SEMICONDUCTOR SUBSTRATE PROCESSING CHAMBER

摘要

The present invention relates to an opening and closing apparatus for a semiconductor substrate processing chamber for easily processing a semiconductor wafer, wherein the opening and closing apparatus includes: an inner chamber made of a nonmetallic material to maintain a first gas for processing a semiconductor at a first pressure higher than the atmospheric pressure; an inner chamber door installed at the bottom of the inner chamber to be opened and closed; an outer chamber outside the inner chamber, which is made of a metallic material to maintain a second gas to be equal or similar to the first pressure; an outer chamber door installed at the bottom of the outer chamber to be opened and closed, wherein a first engaging protrusion is formed around the edge; and a rotational fastening ring installed on the lower outer circumference of the outer chamber to be rotated, wherein a second engaging protrusion corresponding to the first engaging protrusion is formed around the inner edge to allow the outer chamber door to be opened and closed. Therefore, the opening and closing apparatus for a semiconductor substrate processing chamber allows the outer chamber to be easily and tightly fastened.