Lithographic apparatus and device manufacturing method
摘要
<p>A map of the surface of a substrate is generated at a measurement station (30). The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid (10). The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment. <IMAGE></p>
申请公布号
EP1420300(B1)
申请公布日期
2015.07.29
申请号
EP20030257072
申请日期
2003.11.10
申请人
ASML NETHERLANDS B.V.
发明人
LOF, JOERI;DE SMIT, JOANNES THEODOOR;RITSEMA, ROELOF AEILKO SIEBRAND;SIMON, KLAUS;MODDERMAN, THEODORUS MARINUS;MULKENS, JOHANNES CATHARINUS HUBERTUS;MEIJER, HENDRICUS JOHANNES, MARIA;LOOPSTRA, ERIK ROELOF