发明名称 A METHOD OF MAKING A SPLIT GATE NON-VOLATILE FLOATING GATE MEMORY CELL HAVING A SEPARATE ERASE GATE, AND A MEMORY CELL MADE THEREBY
摘要 A non-volatile memory cell has a single crystalline substrate of a first conductivity type with a top surface. A first region of a second conductivity type is in the substrate along the top surface. A second region of the second conductivity type is in the substrate along the top surface, spaced apart from the first region. A channel region is the first region and the second region. A word line gate is positioned over a first portion of the channel region, immediately adjacent to the first region. The word line gate is spaced apart from the channel region by a first insulating layer. A floating gate is positioned over another portion of the channel region. The floating gate has a lower surface separated from the channel region by a second insulating layer, and an upper surface opposite the lower surface. The floating gate has a first side wall adjacent to but separated from the word line gate; and a second side wall opposite the first side wall. The second side wall and the upper surface form a sharp edge, with the second side wall greater in length than the first side wall. The upper surface slopes upward from the first side wall to the second side wall. A coupling gate is positioned over the upper surface of the floating gate and is insulated therefrom by a third insulating layer. An erase gate is positioned adjacent to the second side wall of the floating gate. The erase gate is positioned over the second region and insulated therefrom.
申请公布号 EP2748842(A4) 申请公布日期 2015.07.29
申请号 EP20120826205 申请日期 2012.08.08
申请人 SILICON STORAGE TECHNOLOGY INC. 发明人 WANG, CHUNMING;QIAO, BAOWEI;ZHANG, ZUFA;ZHANG, YI;WANG, SHIUH, LUEN;LU, WEN-JUEI
分类号 H01L21/4763;H01L21/28;H01L27/115;H01L29/423;H01L29/66;H01L29/788 主分类号 H01L21/4763
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