发明名称 STRUCTURES INCORPORATING SILICON NANOPARTICLE INKS, DENSIFIED SILICON MATERIALS FROM NANOPARTICLE SILICON DEPOSITS AND CORRESPONDING METHODS
摘要 <p>Silicon nanoparticle inks provide a basis for the formation of desirable materials. Specifically, composites have been formed in thin layers comprising silicon nanoparticles embedded in an amorphous silicon matrix, which can be formed at relatively low temperatures. The composite material can be heated to form a nanocrystalline material having crystals that are non-rod shaped. The nanocrystalline material can have desirable electrical conductive properties, and the materials can be formed with a high dopant level. Also, nanocrystalline silicon pellets can be formed from silicon nanoparticles deposited form an ink in which the pellets can be relatively dense although less dense than bulk silicon. The pellets can be formed from the application of pressure and heat to a silicon nanoparticle layer. The materials described herein can be effectively used for the formation of doped contacts for crystalline silicon solar cells, thin film silicon solar cells, electronic devices, such as printed electronics, and other useful products.</p>
申请公布号 EP2774174(A4) 申请公布日期 2015.07.29
申请号 EP20120846610 申请日期 2012.10.23
申请人 NANOGRAM CORPORATION 发明人 LIU, GUOJUN;CHIRUVOLU, SHIVKUMAR;LI, WEIDONG;SRINIVASAN, UMA
分类号 H01L21/20;H01L21/208;H01L21/225 主分类号 H01L21/20
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