发明名称 半導体製造装置の原料ガス供給装置
摘要 A raw material gas supply apparatus includes a liquid raw material gas supply source, a source tank storing liquid raw material, a gas distribution passage through which raw material gas comprising steam of the liquid raw material is supplied to a process chamber from the source tank, an automatic pressure regulator installed on an upstream side of the gas passage, wherein the automatic pressure regulator keeps supply pressure of the raw material gas at a set value, a supply gas switching valve installed on a downstream side of the gas passage, wherein this valve opens and closes the gas passage, an orifice provided on at least one of an inlet side or outlet side of the valve, wherein the orifice regulates flow rate of the raw material gas, and a constant temperature heating device heats the source tank, the gas passage, the valve and the orifice to a set temperature.
申请公布号 JP5755958(B2) 申请公布日期 2015.07.29
申请号 JP20110151375 申请日期 2011.07.08
申请人 株式会社フジキン 发明人 永瀬 正明;日高 敦志;平田 薫;土肥 亮介;西野 功ニ;池田 信一
分类号 C23C16/448;H01L21/31 主分类号 C23C16/448
代理机构 代理人
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