| 摘要 |
<p>The purpose of the present invention is to improve a throughput of a substrate processing apparatus. According to the present invention, the substrate processing apparatus comprises: a plurality of processing units to process a plurality of types by a plurality of types of processing conditions with respect to a substrate; a substrate transport device to transport a substrate to a plurality of processing units. As an operation mode with respect to each processing unit, a monitor mode associated with a using treatment liquid can be set. When at least one among a plurality of processing units is set as a monitor mode, import of a product substrate is not indiscriminately forbidden with respect to the processing unit set as the monitor mode by the substrate transport device. Moreover, import to one among at least one processing unit set as the monitor mode is permitted with respect to a product substrate to be processed in relation to a processing condition different from the processing condition related to the monitor mode.</p> |
