| 摘要 |
<p>An embodiment of the present invention includes a first process bath of receiving a chemical solution, a wafer support part which is located in the first process bath and supports wafers, and separators which are moved to the wafers located in the first process bath or can be moved to the outside of the first process bath. The separators are moved to the first process bath to place one of the wafers between two adjacent separators.</p> |
