摘要 |
<p>Provided are a stable method for forming a ceramic film and a ceramic film forming device that apply a polysilane composition to a base material and carry out modification treatment by irradiating the coating film that is formed with vacuum-ultraviolet light, making possible efficient modification of the polysilane composition with good production efficiency. To do so the method for forming a ceramic film that is used comprises an application step for forming a coating film by applying a polysilane composition on a continuously transported strip-shaped base material and a surface modification step for carrying out surface modification by irradiating this coating film with vacuum-ultraviolet light after this application step. This method is characterized by the surface modification step having a vacuum-ultraviolet irradiation means and a surface modification device provided with a surface modification chamber having an oxygen concentration of 10,000 ppm or less and an entrained air elimination chamber having an entrained air elimination means adjacent to the surface modification chamber. The entrained air elimination means controls the pressure in the entrained air elimination chamber to be higher or lower than the pressure in the surface modification chamber.</p> |