| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To simply and quickly evaluate film thickness uniformity of a film that is a film and base material not transmitting light and that is in a range where the spread of a film thickness distribution is 100 [μm] or less and cannot be viewed. <P>SOLUTION: A film thickness uniformity evaluation method for evaluating film thickness uniformity of a film formed on a surface of a metal plate comprises: a measurement step of measuring a profile P of a constituent element of a metal plate in a depth direction by using a glow discharge emission spectral; a calculation step of calculating a function F approximate to a shape of the profile P measured in the measurement step; and an evaluation step of evaluating film thickness uniformity of a film by using the function F calculated in the calculation step. Thus, the method can simply and quickly evaluate film thickness uniformity of a film that is a film and base material not transmitting light and that is in a range where the spread of a film thickness distribution is 100 [μm] or less and cannot be viewed. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
