发明名称 |
微細パターン転写用のモールドの製造方法及びそれを用いた回折格子の製造方法、並びに該回折格子を有する有機EL素子の製造方法 |
摘要 |
A method for producing a mold includes: applying a block copolymer solution 30 made of first and second polymers on a base member 10; performing a first annealing process at a temperature higher than a glass transition temperature of the block copolymer after drying the coating film; forming a concavity and convexity structure 36 on the base member by removing the second polymer by an etching process; performing a second annealing process of the concavity and convexity structure 36 at a temperature higher than a glass transition temperature of the first polymer; forming a seed layer 40 on the concavity and convexity structure; laminating or stacking a metal layer 50 on the seed layer 40 by an electroforming; and peeling off the metal layer 50 from the base member. The second annealing process enables satisfactory transfer of a concavity and convexity structure 70 on the base member onto the metal layer. Accordingly, there is provided a mold for minute pattern transfer, which is suitable for producing an optical component such as a diffraction grating. |
申请公布号 |
JP5755662(B2) |
申请公布日期 |
2015.07.29 |
申请号 |
JP20120552766 |
申请日期 |
2012.01.13 |
申请人 |
JX日鉱日石エネルギー株式会社;国立大学法人東京工業大学 |
发明人 |
増山 聡;福島 麻登香;西村 涼;福田 真林;關 隆史 |
分类号 |
B29C33/38;B29C33/42;B29C39/26;B29C59/02;G02B5/18;H01L21/027;H01L51/50;H05B33/02;H05B33/10 |
主分类号 |
B29C33/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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