SURFACE PLASMON MICROSCOPY

摘要

Surface plasmon microscopy methods are described which comprise irradiating a sample with a beam of electromagnetic radiation, wherein at least some of the radiation is incident on the sample at an angle or angles which results in the excitation of surface plasmons in the sample, and wherein the beam of radiation comprises a longitudinal axis passing through a focus of the beam. Both radiation reradiated from the sample by one or more surface plasmons and radiation reflected from a location on the sample which does not lie on the longitudinal axis passing through the focusare received at a detector. The received reradiated radiation is then interfered with the received reflected radiation to provide information about the sample. Apparatus for performing the methods is also described.