Plasma processing apparatus and plasma processing method

摘要

A plasma processing apparatus can excite uniform plasma on a large substrate. The plasma processing apparatus 10 includes a vacuum chamber 100 having therein a mounting table 115 configured to mount a substrate G, and a plasma space, formed above the mounting table, in which plasma is generated; a first coaxial waveguide 225 through which a high frequency power for exciting plasma is supplied into the vacuum chamber 100; a waveguide path 205, connected to the first coaxial waveguide 225, having a slit-shaped opening toward the plasma space; and an adjusting unit configured to adjust a wavelength of the high frequency power propagating in the waveguide path in a lengthwise direction of the slit-shaped opening. By adjusting the wavelength of the high frequency power propagating in the waveguide path to be sufficiently lengthened, uniform plasma can be excited on the large substrate.

主权项

1. A plasma processing apparatus comprising:
a decompression chamber that includes therein a mounting table configured to mount a processing target object thereon; and a plasma space in which plasma is generated, the plasma space being formed above the mounting table; a transmission path comprising a first coaxial waveguide through which a high frequency power for exciting plasma is supplied into the decompression chamber; a waveguide path, connected to the transmission path, having a slit-shaped opening toward the plasma space; a matching device which is connected to a high frequency power supply; an adjusting unit configured to adjust an effective height of the waveguide path and adjust wavelength of a high frequency power propagating in the waveguide path in a lengthwise direction of the slit-shaped opening; a reflectometer connected to the first coaxial waveguide and configured to measure a reflection or an impedance of a high frequency power propagating in the first coaxial waveguide; and a controller configured to adjust a wavelength of the high frequency power propagating in the waveguide path in the lengthwise direction of the slit-shaped opening based on the reflection or the impedance measured by the reflectometer, wherein both ends of the waveguide path in the lengthwise direction of the slit-shaped opening are not short-circuited.