Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method

摘要

A resin composition for forming a resist underlayer film includes a resin that includes an aromatic ring, and a crosslinking agent having a partial structure represented by a following formula (i). X represents an oxygen atom, a sulfur atom, *—COO— or —NRA—. R1 represents a hydrogen atom or a C1-30 monovalent hydrocarbon group. R2 represents a hydroxy group, a sulfanil group, a cyano group, a nitro group, a C1-30 monovalent hydrocarbon group, a C1-30 monovalent oxyhydrocarbon group or a C1-30 monovalent sulfanilhydrocarbon group. p is an integer of 1 to 3.;

主权项

1. A resin composition for forming a resist underlayer film, comprising:
a resin that comprises an aromatic ring; and a crosslinking agent represented by formula (B-1): wherein Me is a methyl group.