发明名称 |
Acrylic acid ester derivative, polymer compound and photoresist composition |
摘要 |
Provided is a photoresist composition containing a polymer that contains, as a constituent unit, a specific methacrylic acid ester derivative. The photoresist composition can form a photoresist pattern with improved LWR and high resolution. More specifically, provided is an acrylic acid ester derivative represented by the following general formula (1):;wherein R1 is a hydrogen atom or a methyl group; and A represents the following general formula (A-1) or (A-2):;wherein R2 and R3 are each independently an alkyl group having 1 to 6 carbon atoms or a cyclic hydrocarbon group having 3 to 6 carbon atoms; Z is CH2 or —O—; and n is 0 or 1; with the proviso that in (A-1) there is no case where R2 is a methyl group and Z is CH2 and n is 1. |
申请公布号 |
US9091917(B2) |
申请公布日期 |
2015.07.28 |
申请号 |
US201213983222 |
申请日期 |
2012.01.18 |
申请人 |
KURARAY CO., LTD. |
发明人 |
Nakayama Osamu |
分类号 |
G03F7/004;C07C271/34;C07D307/14;C07D309/12;C08F220/36;C08F224/00;C08F228/06;G03F7/039;C07D307/20;C07D309/10;C08F20/36 |
主分类号 |
G03F7/004 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. An acrylic acid ester derivative represented by the following general formula (1): wherein R1 is a hydrogen atom or a methyl group; and A represents the following general formula (A-1) or (A-2): wherein R2 and R3 are each independently an alkyl group having 1 to 6 carbon atoms or a cyclic hydrocarbon group having 3 to 6 carbon atoms; Z is CH2 or —O—; and n is 0 or 1; with the proviso that in (A-1) there is no case where R2 is a methyl group and Z is CH2 and n is 1. |
地址 |
Kurashiki-shi JP |