Additives to improve the performance of a precursor source for cobalt deposition

摘要

Methods of forming cobalt films utilizing a cobalt precursor comprising an additive are described. Those methods may include adding an additive to a cobalt precursor, wherein the cobalt precursor is located in an ampoule that is coupled with a deposition tool, and then forming a cobalt film using the cobalt precursor comprising the additive. Non-volatile decomposition products of the cobalt precursor are solubilized in the ampoule.

主权项

1. A method of forming a cobalt thin film comprising:
adding an additive to a cobalt precursor, wherein the cobalt precursor is located in an ampoule of a deposition tool; and forming a cobalt film using the cobalt precursor comprising the additive, wherein non-volatile decomposition products of the cobalt precursor are solubilized in the ampoule.