发明名称 APPARATUS FOR PROCESSING A WAFER
摘要 <p>According to an embodiment, an apparatus for processing a wafer includes: a first plate which is for placing at least one carrier into which the wafer inserted, and has first holes; a first injection unit which is connected to the first holes; a second plate which faces the first plate and has second holes; a second injection unit which is connected to the second holes; and a first motor and a second motor which drive the first plate and the second plate, respectively.</p>
申请公布号 KR20150085959(A) 申请公布日期 2015.07.27
申请号 KR20140005982 申请日期 2014.01.17
申请人 LG SILTRON INCORPORATED 发明人 KANG, CHI HUN
分类号 H01L21/304 主分类号 H01L21/304
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