| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with a good profile can be formed.SOLUTION: The following polymeric compound and a resist composition containing the polymeric compound are provided. The polymeric compound has a structural unit (a0) represented by general formula (a0-1) and a structural unit (a2m) including a polycyclic group excluding the structural unit (a0), and including a lactone-containing polycyclic group, a polycyclic group containing -SO-, or a carbonate-containing polycyclic group. In formula (a0-1), Rrepresents a hydrocarbon group having 1 to 6 carbon atoms which may have a substituent, or a hydrogen atom; Yarepresents a single bond or a divalent connecting group; L represents an ester bond; Rarepresents a polycyclic group of crosslinked rings or condensed rings, containing -C(=O)O- or -SO- in a cycle skeleton thereof and at least one substituent selected from the group consisting of an alkyl group, an alkoxy group, a halogen atom, and a halogenated alkyl group. |
