| 摘要 |
The present invention relates to an apparatus for processing a hydrophobic surface, capable of performing a certain hydrophobic process with respect to a surface of a material with a low processing cost by utilizing fluoride resin to be a fluoride supply source. According to the present invention, an apparatus for processing a hydrophobic surface comprises: a housing which is a container shape having a consistent inner space in the center; a high voltage electrode unit installed in a lower side inside the housing and applied with high voltage; a fluoride supply unit installed in an upper side of the high voltage electrode unit and supplying a fluoride reactant to an inner space of the housing and the high voltage electrode unit; and a plasma injection unit installed to be grounded on a lower surface of the housing and injecting generated plasma to a lower direction. |
