| 摘要 |
According to a substrate processing method by the embodiment, ultrapure water is supplied to a substrate surface. A solvent containing fluoride alcohol is supplied to the substrate surface wherein the ultrapure water is attached. A first solvent, which has the solubility for the solvent containing fluoride alcohol and is different with the solvent containing fluoride alcohol, is supplied to the substrate surface wherein the solvent containing fluoride alcohol is attached. The substrate wherein the first solvent is attached is inserted into a chamber, and then the first solvent on the substrate surface is substituted with supercritical fluid. The supercritical fluid is transformed into gas by reducing the pressure inside the chamber. The substrate is discharged from the chamber. A problem to be solved of the invention is to provide the substrate processing method and an apparatus thereof capable of executing a supercritical drying process without a problem such as a pattern collapse, etc. |
