| 发明名称 |
NOVEL SULFONYLIMIDE SALT COMPOUDS, PREPARATION THEREOF, PHOTOSENSITIVE RESIN COMPOSITION AND ADHESIVE COMPOSITION HAVING THE SAME |
| 摘要 |
<p>The present invention relates to a novel sulfonylimide salt compound, a photo acid generator and a photosensitive resin composition including the same and, more specifically, a photosensitive resin composition, which includes a sulfonylimide salt compound denoted by chemical formula 1 and accordingly has good photosensitivity, thereby significantly increasing a curing rate.</p> |
| 申请公布号 |
KR20150086050(A) |
申请公布日期 |
2015.07.27 |
| 申请号 |
KR20140006184 |
申请日期 |
2014.01.17 |
| 申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
CHOI, HAN YOUNG |
| 分类号 |
C01B21/088;C01B21/086;G03F7/004 |
主分类号 |
C01B21/088 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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