PHOTOSENSITIVE RESIN COMPOSITION

摘要

The present invention provides a photosensitive resin composition comprising: (A) an alkali soluble resin; (B) a photo-polymerizable compound; (C) a photopolymerization initiator; and (E) a solvent, wherein a monofunctional monomer having 100 to 500 g/mol of the molecular weight is included in 1 to 5 wt% as a high-resolution agent based on the total weight of solids of the photosensitive resin composition. Also, the present invention provides a pattern using the same, and an image display device including the pattern. According to the present invention, the photosensitive resin composition can reduce critical dimension bias (CD-bias) without reduction of sensitivity, thereby being effectively used for manufacturing a high-resolution image display device.