| 发明名称 |
DEVICE AND METHOD FOR PRODUCING HERMETICALLY-SEALED CAVITIES |
| 摘要 |
An apparatus may include a first support covered with at least one ALD precursor and/or at least one MLD precursor, and a second support covered with at least one ALD precursor and/or at least one MLD precursor which is/are complementary to the ALD precursor and/or MLD precursor of the first support. The first support is at least partly joined to the second support by an atomic bond between the ALD precursor of the first support and the ALD precursor of the second support or between the MLD precursor of the first support and the MLD precursor of the second support in such a way that an ALD layer or an MLD layer is formed. |
| 申请公布号 |
US2015207101(A1) |
申请公布日期 |
2015.07.23 |
| 申请号 |
US201314417169 |
申请日期 |
2013.07.18 |
| 申请人 |
OSRAM OLED GmbH |
发明人 |
Lang Erwin;Reusch Thilo;Schwamb Philipp |
| 分类号 |
H01L51/52;C23C16/455;H05K5/06 |
主分类号 |
H01L51/52 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus comprising:
a first support covered with at least one ALD precursor (302) and/or at least one MLD precursor; and a second support covered with at least one ALD precursor and/or at least one MLD precursor which is/are complementary to the ALD precursor and/or MLD precursor of the first support; wherein the first support is at least partly joined to the second support by an atomic bond between the ALD precursor of the first support and the ALD precursor of the second support or between the MLD precursor of the first support and the MLD precursor of the second support in such a way that an ALD layer or an MLD layer is formed. |
| 地址 |
Regensburg DE |
