发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY UNIT
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of suppressing occurrence of striations, and capable of forming a coating film of high quality being uniform over a whole coating film, and also to provide a display unit using the same.SOLUTION: A photosensitive resin composition includes a resin (A), a polymerizable compound (B), a polymerization initiator (C) and a solvent (D). The resin (A) has a weight average molecular weight (Mw) of 5,000-50,000 in terms of polystyrene, and molecular weight distribution [Mw/number average molecular weight (Mn)] of 1.1-4.0. The solvent (D) includes a solvent expressed by formula (D1): R-O-(A-O)-R(D1) (In the formula, Rand Reach denote a straight-chain or branched alkyl group. A denotes a straight-chain or branched alkylene group. n denotes an integer 2 or 3.)
申请公布号 JP2015132832(A) 申请公布日期 2015.07.23
申请号 JP20150028375 申请日期 2015.02.17
申请人 SUMITOMO CHEMICAL CO LTD 发明人 SHIRAKAWA MASAKAZU
分类号 G03F7/004;G02F1/1333;G03F7/027;G03F7/11;H01L21/027 主分类号 G03F7/004
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