| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a Cu-alloy wiring that is used as a protective film of a Cu wiring material, forms an ohmic connection with an ITO film, and has excellent etching property, oxidation resistance, and corrosion resistance.SOLUTION: The Cu-alloy wiring comprises a composition containing at least Ni and Mn, and the balance Cu that may include an inevitable component. When a plane of XY-coordinates is defined by an X axis and a Y axis representing a content of Ni (wt.%) and a content of Mn (wt.%), respectively, the contents of Ni and Mn in the composition are within a range enclosed by the following four points (A), (B), (C), and (D). (A) Ni:20 wt.% and Mn:10 wt.%, (B) Ni:15 wt.% and Mn:20 wt.%, (C) Ni:20 wt.% and Mn:20 wt.%, and (D) Ni:25 wt.% and Mn:15 wt.%. A work function of the Cu-alloy wiring is in a range from 0 eV to -0.2 eV with respect to the work function of ITO.</p> |
