| 发明名称 |
APPARATUS FOR GENERATING AND MAINTAINING PLASMA FOR PLASMA PROCESSING |
| 摘要 |
An apparatus for generating and maintaining plasma for plasma processing using inductively coupled RF power. The apparatus includes a resonant circuit having a resonant capacitance and a resonant inductance, an excitation circuit for exciting the resonant circuit, and a coupling dement for coupling RF power from the inductance into a plasma chamber. |
| 申请公布号 |
US2015206711(A1) |
申请公布日期 |
2015.07.23 |
| 申请号 |
US201314417214 |
申请日期 |
2013.07.24 |
| 申请人 |
TRUMPF Huettinger Sp. z.o.o. |
发明人 |
Ozimek Pawel;Klimczak Andrzej;Zelechowski Marcin;Golan Marcin |
| 分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus comprising:
a. a resonant circuit comprising a resonant capacitance and a resonant inductance; b. an excitation circuit for exciting the resonant circuit; and c. a coupling element for coupling RF power from the inductance into a plasma chamber, wherein the apparatus is configured to generate and maintain plasma for plasma processing using inductively coupled RF power. |
| 地址 |
Zielonka PL |
