| 发明名称 |
TWO-DIMENSIONAL MASS RESOLVING SLIT MECHANISM FOR SEMICONDUCTOR PROCESSING SYSTEMS |
| 摘要 |
An adjustable mass-resolving slit assembly includes an aperture portion and an actuation portion. The aperture portion includes first and second shield members that define an aperture therebetween for receiving an ion beam during semiconductor processing operations. The actuation portion is coupled to the aperture portion and selectively and independently adjusts the position of the first and second shield members along first and second non-parallel axes. Adjusting the position of the first and second shield members along the first axis adjusts a width of the aperture. Adjusting the position of the first and second shield members along the second axis adjusts a region of the first and second shield members impinged by the ion beam. Methods for using the adjustable mass-resolving slit assembly are also disclosed. |
| 申请公布号 |
US2015206701(A1) |
申请公布日期 |
2015.07.23 |
| 申请号 |
US201414158972 |
申请日期 |
2014.01.20 |
| 申请人 |
Varian Semiconductor Equipment Associates, Inc. |
发明人 |
Schaller Jason M.;Vopat Robert B. |
| 分类号 |
H01J37/05 |
主分类号 |
H01J37/05 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An adjustable mass-resolving slit assembly, comprising:
an aperture portion comprising first and second shield members that define an aperture therebetween for receiving an ion beam during semiconductor processing operations; and an actuation portion coupled to the aperture portion, the actuation portion for selectively and independently adjusting a position of the first and second shield members along first and second non-parallel axes; wherein adjusting the position of the first and second shield members along the first axis adjusts a width of the aperture; and wherein adjusting the position of the first and second shield members along the second axis adjusts a region of the first and second shield members impinged by the ion beam. |
| 地址 |
Gloucester MA US |
