| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an EUV light source configured so that highly bright uniform EUV light is provided to a reticle and contamination of an EUV collector mirror is little.SOLUTION: Highly bright uniform illumination light having a large irradiation opening number is obtained at a reticle with one EUV light collector mirror or few illumination mirrors by providing a collector mirror for collecting laser light to be irradiated to a target for obtaining EUV light with multiple slits or multiple fine tubes, making the EUV light to be diverged by making the EUV light generated from a small range to repeat total reflections inside the multiple slits or the multiple fine tubes.</p> |
