| 发明名称 |
ROUGHENED SUBSTRATE SUPPORT |
| 摘要 |
The present disclosure generally relates to a substrate support for use in a substrate processing chamber. A roughened substrate support reduces arcing within the chamber and also contributes to uniform deposition on the substrate. A substrate support may have a substrate support body having a surface roughness of between about 707 micro-inches and about 834 micro-inches. The substrate support may have an anodized coating on the substrate support. |
| 申请公布号 |
US2015202739(A1) |
申请公布日期 |
2015.07.23 |
| 申请号 |
US201514675379 |
申请日期 |
2015.03.31 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
LEE Dongsuh;STERLING William N.;PARK Beom Soo;CHOI Soo Young |
| 分类号 |
B24C1/06 |
主分类号 |
B24C1/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate support, comprising:
a substrate support body having a surface roughness of between about 707 micro-inches and about 834 micro-inches; and an anodized coating on the substrate support. |
| 地址 |
Santa Clara CA US |
