| 摘要 |
<p>In the present invention, disclosed is a heater monitoring system for a semiconductor thin film deposition apparatus. According to the present invention, the abnormal state of a heater is determined by detecting an RF signal inputted to a heater heating coil in a plasma process and comparing the detected RF signal with a normal signal range in a diagnosing unit. The abnormal state of the heater is determined by selectively comparing accumulated error data transmitted from an RF filter with a preset error range signal. A heater driving voltage is applied to the heater from a power supply unit through the RF filter. Thereby, the voltage is stably supplied.</p> |
