| 发明名称 |
KIT FOR PRODUCING POLISHING COMPOSITION, AND USE THEREOF |
| 摘要 |
<p>The purpose of the present invention is to provide a kit for producing a polishing composition, the kit enabling the production of a polishing composition that exhibits high pH maintainability, and the kit exhibiting excellent storage stability. Provided by the present invention is a kit for producing a polishing composition, which is used to produce a polishing composition that contains silica particles as abrasive grains, a strong base and a salt of a weak acid. This kit for producing a polishing composition includes a plurality of agents that are stored separately from each other. A mixed liquid prepared by combining the plurality of agents has an initial pH of 8.0-11.8.</p> |
| 申请公布号 |
WO2015107992(A1) |
申请公布日期 |
2015.07.23 |
| 申请号 |
WO2015JP50495 |
申请日期 |
2015.01.09 |
| 申请人 |
FUJIMI INCORPORATED |
发明人 |
ODA, HIROYUKI;TAKAMI, SHINICHIRO;TABATA, MAKOTO;MORI, YOSHIO |
| 分类号 |
C09K3/14;B24B37/00;C09G1/02;H01L21/304 |
主分类号 |
C09K3/14 |
| 代理机构 |
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