发明名称 COMPOSITION FOR OPTICAL IMPRINT AND METHOD FOR PRODUCING PATTERN USING THE SAME
摘要 A composition for optical imprint having excellent transferability of a mold shape and giving a pattern having excellent alkali resistance at high temperature by optical imprint and subsequent heating and a method for producing a pattern using the composition. The composition includes a polysiloxane including a structural unit 1 represented by Formula (a1) and a structural unit 2 represented by Formula (a2) and a polymerization initiator. The polysiloxane has a structural unit 1 content of 30% to 85% by mole and a structural unit 2 content of 15% to 70% by mole based on the entire structural units in the polysiloxane. In the formulae, R1 represents a group containing an ethylenic double bond, and R2 represents an aryl group having 6 to 15 carbon atoms which may have a substituent.;
申请公布号 US2015203683(A1) 申请公布日期 2015.07.23
申请号 US201514598596 申请日期 2015.01.16
申请人 Tokyo Ohka Kogyo Co., Ltd. 发明人 Murota Atsushi
分类号 C08L83/04 主分类号 C08L83/04
代理机构 代理人
主权项 1. A composition for optical imprint comprising: a polysiloxane including a structural unit 1 represented by Formula (a1) and a structural unit 2 represented by Formula (a2); and a polymerization initiator, wherein the polysiloxane has a structural unit 1 content of 30% to 85% by mole and a structural unit 2 content of 15% to 70% by mole based on the entire structural units in the polysiloxane, wherein, R1 represents a group containing an ethylenic double bond and R2 represents an aryl group having 6 to 15 carbon atoms which may have a substituent.
地址 Kawasaki-shi JP