发明名称 |
COMPOSITION FOR OPTICAL IMPRINT AND METHOD FOR PRODUCING PATTERN USING THE SAME |
摘要 |
A composition for optical imprint having excellent transferability of a mold shape and giving a pattern having excellent alkali resistance at high temperature by optical imprint and subsequent heating and a method for producing a pattern using the composition. The composition includes a polysiloxane including a structural unit 1 represented by Formula (a1) and a structural unit 2 represented by Formula (a2) and a polymerization initiator. The polysiloxane has a structural unit 1 content of 30% to 85% by mole and a structural unit 2 content of 15% to 70% by mole based on the entire structural units in the polysiloxane. In the formulae, R1 represents a group containing an ethylenic double bond, and R2 represents an aryl group having 6 to 15 carbon atoms which may have a substituent.; |
申请公布号 |
US2015203683(A1) |
申请公布日期 |
2015.07.23 |
申请号 |
US201514598596 |
申请日期 |
2015.01.16 |
申请人 |
Tokyo Ohka Kogyo Co., Ltd. |
发明人 |
Murota Atsushi |
分类号 |
C08L83/04 |
主分类号 |
C08L83/04 |
代理机构 |
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代理人 |
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主权项 |
1. A composition for optical imprint comprising:
a polysiloxane including a structural unit 1 represented by Formula (a1) and a structural unit 2 represented by Formula (a2); and a polymerization initiator, wherein the polysiloxane has a structural unit 1 content of 30% to 85% by mole and a structural unit 2 content of 15% to 70% by mole based on the entire structural units in the polysiloxane, wherein, R1 represents a group containing an ethylenic double bond and R2 represents an aryl group having 6 to 15 carbon atoms which may have a substituent. |
地址 |
Kawasaki-shi JP |