发明名称 |
HIGH-CHI BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY |
摘要 |
Compositions for directed self-assembly (DSA) patterning techniques are provided. Methods for directed self-assembly are also provided in which a DSA composition comprising a block copolymer (BCP) is applied to a substrate and then self-assembled to form the desired pattern. The block copolymer includes at least two blocks and is selected to have a high interaction parameter (Chi). The BCPs are able to form perpendicular lamellae by simple thermal annealing on a neutralized substrate, without a top coat. The BCPs are also capable of micro-phase separating into lines and spaces measuring at 10 nm or smaller, with sub-20-nm Lo capability. |
申请公布号 |
WO2015109224(A1) |
申请公布日期 |
2015.07.23 |
申请号 |
WO2015US11811 |
申请日期 |
2015.01.16 |
申请人 |
BREWER SCIENCE INC. |
发明人 |
XU, KUI;HOCKEY, MARY ANN;CALDERAS, ERIC |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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