| 摘要 |
PROBLEM TO BE SOLVED: To improve detection accuracy of abnormality of a substrate processing apparatus.SOLUTION: An abnormality detection apparatus 520 includes: a data collection part 522 for collecting data detected by sensors 270-1 to 270-a, 370-1 to 370-b, 470-1 to 470-c provided in a CMP device. Further, the abnormality detection apparatus 520 includes a determination part 524 in which recipe data is read out from a recipe storage part 512 having the recipe data specifying procedures or methods related to substrate processing of the CMP device stored therein, in which the read out recipe data and data collected by a data collection part 522 are compared to each other, and which, when there is a difference therebetween, determines that the CMP device has abnormality. |
