发明名称 ALLOY AND SPUTTERING TARGET MATERIAL FOR SOFT MAGNETIC FILM LAYER FOR USE IN MAGNETIC RECORDING MEDIUM AND HAVING LOW SATURATION MAGNETIC FLUX DENSITY
摘要 PROBLEM TO BE SOLVED: To provide an alloy and a sputtering target material for a soft magnetic film layer for use in a magnetic recording medium and having a low saturation magnetic flux density.SOLUTION: The alloy for a soft magnetic thin-film layer in a magnetic recording medium is provided which contains by at%, one or more of Y, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Ni, Cu, Al, B, C, Si, P, Zn, Ga, Ge and Sn, and the balance comprising Co and Fe, and which satisfies the following formula (1) to (5). (1) 0.50≤Fe%/(Fe%+Co%)≤0.90, (2) 5≤TAM≤23, (3) 18≤TAM+TNM≤23, (4) 0≤(Nb%+Ta%)/(TAM+TNM)≤0.74, (5) 0≤Ti%+Zr%+Hf%+B%/2≤6, where TAM=Y%+Ti%+Zr%+Hf%+V%+Nb%+Ta%+B%/2, TNM=Cr%+Mo%+W%+Mn%+Ni%/3+Cu%/3+Al%+C%+Si%+P%+Zn%+Ga%+Ge%+Sn%.
申请公布号 JP2015132018(A) 申请公布日期 2015.07.23
申请号 JP20150022484 申请日期 2015.02.06
申请人 SANYO SPECIAL STEEL CO LTD 发明人 SAWADA TOSHIYUKI;MATSUBARA YOSHIAKI
分类号 C22C38/00;C23C14/34;G11B5/738;G11B5/851 主分类号 C22C38/00
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