发明名称 PROCESS FOR PRODUCING SINGLE-CRYSTAL SILICON CARBIDE
摘要 A process for producing single-crystal silicon carbide is provided with which it is possible to easily separate the single-crystal silicon carbide from the pedestal. The process comprises a step (S10) in which a seed substrate is affixed to a pedestal through a stress-relieving layer, a step (S20) in which single-crystal silicon carbide is grown on the seed substrate, a step (S30) in which the single-crystal silicon carbide is separated from the pedestal at the stress-relieving layer, and a step (S40) in which the residue of the stress-relieving layer which is adherent to the single-crystal silicon carbide after the separation step (S30) is removed.
申请公布号 WO2015107772(A1) 申请公布日期 2015.07.23
申请号 WO2014JP80849 申请日期 2014.11.21
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 HORI, TSUTOMU;UETA, SHUNSAKU;MATSUSHIMA, AKIRA
分类号 C30B29/36;C30B23/06;C30B33/00 主分类号 C30B29/36
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