发明名称 |
PROCESS FOR PRODUCING SINGLE-CRYSTAL SILICON CARBIDE |
摘要 |
A process for producing single-crystal silicon carbide is provided with which it is possible to easily separate the single-crystal silicon carbide from the pedestal. The process comprises a step (S10) in which a seed substrate is affixed to a pedestal through a stress-relieving layer, a step (S20) in which single-crystal silicon carbide is grown on the seed substrate, a step (S30) in which the single-crystal silicon carbide is separated from the pedestal at the stress-relieving layer, and a step (S40) in which the residue of the stress-relieving layer which is adherent to the single-crystal silicon carbide after the separation step (S30) is removed. |
申请公布号 |
WO2015107772(A1) |
申请公布日期 |
2015.07.23 |
申请号 |
WO2014JP80849 |
申请日期 |
2014.11.21 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
HORI, TSUTOMU;UETA, SHUNSAKU;MATSUSHIMA, AKIRA |
分类号 |
C30B29/36;C30B23/06;C30B33/00 |
主分类号 |
C30B29/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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