| 摘要 |
PROBLEM TO BE SOLVED: To provide a negative resist material, particularly, a chemically amplified negative resist material having high resolution, giving a good pattern profile after exposure, and exhibiting high durability as a permanent film.SOLUTION: The negative resist material comprises, as a base resin, a novolac resin having a repeating unit (a) represented by general formula (1) below. In general formula (1), Rrepresents one of a hydrogen atom, hydroxy group, linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, alkoxy group, acyl group, acyloxy group, and alkoxycarbonyl group; Rrepresents one of a hydrogen atom, linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, alkenyl group having 2 to 10 carbon atoms, and aryl group having 6 to 10 carbon atoms, which may include a hydroxy group, alkoxy group, ether group, thioether group, carboxyl group, alkoxycarbonyl group, or acyloxy group; and a satisfies 0<a≤1. |
